Nicholas C. Strandwitz

ScholarGPS™ ID: 88238254259340

Affiliation

Lehigh University, Bethlehem, United States

Affiliation History

Field

Engineering and Computer Science

Discipline

Materials Science and Engineering

Top Specialties

Metrics Summary

Publication Count

Predicted Citations

3,343

Predicted h-index

Ranking

Publications and Citation History

Publications based on Top Specialties

Types of Publication

Publications
Books
Patents
NIH/NSF


Oxide Coatings for Semiconductor Light Absorbers: Advanced Synthesis and Applications (book chapter) In Ultrathin Oxide Layers for Solar and Electrocatalytic Systems Davis, B. E. \| Garland, B. M. \| Strandwitz, N. C. The Royal Society of Chemistry (2022) 10.1039/9781839163708-00008 Cite \| Source
Ultrathin atomic layer deposited niobium oxide as a passivation layer in silicon based photovoltaics (journal article) Leach, Connor J. \| Davis, Benjamin E. \| Garland, Ben M. \| Thorpe, Ryan \| Strandwitz, Nicholas C. Journal of Applied Physics, volume 130, issue 21 (2021). 10.1063/5.0067281 Cited by (1) \| Cite \| Source
Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering (journal article) Singhania, Raivathari M. \| Price, Henry \| Kounga, Vaneck Y. \| Davis, Benjamin \| Brüner, Philipp \| Thorpe, Ryan \| Hynek, David J. \| Cha, Judy J. \| Strandwitz, Nicholas C. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 39, issue 6 (2021). 10.1116/6.0001164 Cited by (2) \| Cite \| Source
Effects of growth substrate on the nucleation of monolayer MoTe2 (journal article) Hynek, David J. \| Singhania, Raivat M. \| Hart, James L. \| Davis, Benjamin \| Wang, Mengjing \| Strandwitz, Nicholas C. \| Cha, Judy J. CrystEngComm, volume 23, issue 45, pages 7963-7969 (2021). 10.1039/D1CE00275A Cited by (3) \| Cite \| Source
Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure (journal article) Chowdhury, Md. Istiaque \| Sowa, Mark \| Van Meter, Kylie E. \| Babuska, Tomas F. \| Grejtak, Tomas \| Kozen, Alexander C. \| Krick, Brandon A. \| Strandwitz, Nicholas C. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 39, issue 5 (2021). 10.1116/6.0001175 Cited by (1) \| Cite \| Source
Exploiting Fixed Charge to Control Schottky Barrier Height in Si\|Al2 O3 \|MoOx – based Tunnel Diodes (conference) Garland, Ben M. \| Davis, Benjamin E. \| Strandwitz, Nicholas C. 2021 IEEE 48th Photovoltaic Specialists Conference (PVSC) (2021) Fort Lauderdale, FL, USA 10.1109/PVSC43889.2021.9519088 Cited by (1) \| Cite \| Source
cm2 -Scale Synthesis of MoTe2 Thin Films with Large Grains and Layer Control (journal article) Hynek, David J. \| Singhania, Raivat M. \| Xu, Shiyu \| Davis, Benjamin \| Wang, Leizhi \| Yarali, Milad \| Pondick, Joshua V. \| Woods, John M. \| Strandwitz, Nicholas C. \| Cha, Judy J. ACS Nano, volume 15, issue 1, pages 410-418 (2021). 10.1021/acsnano.0c08069 Cited by (18) \| Cite \| Source
Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions (journal article) Chowdhury, Md. Istiaque \| Sowa, Mark \| Kozen, Alexander C. \| Krick, Brandon A. \| Haik, Jewel \| Babuska, Tomas F. \| Strandwitz, Nicholas C. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 39, issue 1 (2021). 10.1116/6.0000717 Cited by (6) \| Cite \| Source
A Selectively Colorful yet Chilly Perspective on theHighs andLows of Dielectric Materials for CMOS Nanoelectronics (conference) King, S. \| Plombon, J. \| Bielefeld, J. \| Blackwell, J. \| Vyas, S. \| Chebiam, R. \| Naylor, C. \| Michalak, D. \| Kobrinsky, M. \| Gstrein, F. \| ... \| Orlowski, M. 2020 IEEE International Electron Devices Meeting (IEDM) (2020) San Francisco, CA, USA 10.1109/IEDM13553.2020.9371942 Cited by (3) \| Cite \| Source
Electrical properties of MgO/GaN metal-oxide-semiconductor structures (journal article) Ogidi-Ekoko, Onoriode N. \| Goodrich, Justin C. \| Howzen, Alexandra J. \| Peart, Matthew R. \| Strandwitz, Nicholas C. \| Wierer, Jonathan J. \| Tansu, Nelson Solid-State Electronics, volume 172 (2020). 10.1016/j.sse.2020.107881 Cited by (6) \| Cite \| Source
Temperature-Dependent RF Characteristics of Al₂O₃-Passivated WSe₂ MOSFETs (journal article) Xiong, Kuanchen \| Zhang, Xiaotian \| Li, Lei \| Zhang, Fu \| Davis, Benjamin \| Madjar, Asher \| Goritz, Alexander \| Wietstruck, Matthias \| Kaynak, Mehmet \| Strandwitz, Nicholas C. \| ... \| Hwang, James C. M. IEEE Electron Device Letters, volume 41, issue 7, pages 1134-1137 (2020). 10.1109/LED.2020.2999906 Cite \| Source
A Systematic Investigation of Aluminum Oxide Passivating Tunnel Layers for Titanium Oxide Electron-Selective Contacts (conference) Davis, Benjamin E. \| Strandwitz, Nicholas C. 2020 IEEE 47th Photovoltaic Specialists Conference (PVSC) (2020) Calgary, AB, Canada 10.1109/PVSC45281.2020.9300502 Cited by (2) \| Cite \| Source
Aluminum Oxide Passivating Tunneling Interlayers for Molybdenum Oxide Hole-Selective Contacts (journal article) Davis, Benjamin E. \| Strandwitz, Nicholas C. IEEE Journal of Photovoltaics, volume 10, issue 3, pages 722-728 (2020). 10.1109/JPHOTOV.2020.2973447 Cited by (21) \| Cite \| Source
Surface pretreatment and deposition temperature dependence of MgO epitaxy on GaN by thermal atomic layer deposition (journal article) Goodrich, Justin C. \| Farinha, Thomas G. \| Ju, Ling \| Howzen, Alexandra J. \| Kundu, Animesh \| Ogidi-Ekoko, Onoriode N. \| Wierer, Jonathan J. \| Tansu, Nelson \| Strandwitz, Nicholas C. Journal of Crystal Growth, volume 536 (2020). 10.1016/j.jcrysgro.2020.125568 Cited by (6) \| Cite \| Source
Plasma-enhanced atomic layer deposition of vanadium nitride (journal article) Kozen, Alexander C. \| Sowa, Mark J. \| Ju, Ling \| Strandwitz, Nicholas C. \| Zeng, Guosong \| Babuska, Tomas F. \| Hsain, Zakaria \| Krick, Brandon A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 37, issue 6 (2019). 10.1116/1.5109671 Cited by (6) \| Cite \| Source
Quartz crystal microbalance study of precursor diffusion during molecular layer deposition using cyclic azasilane, maleic anhydride, and water (journal article) Ju, Ling \| Vemuri, Vamseedhara \| Strandwitz, Nicholas C. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 37, issue 3 (2019). 10.1116/1.5093509 Cited by (5) \| Cite \| Source
Absence of Evidence for Fixed Charge in Metal-Aluminum Oxide-Silicon Tunnel Diodes (journal article) Marstell, Roderick J. \| Pugliese, Anthony \| Strandwitz, Nicholas C. physica status solidi (b), volume 256, issue 3, pages 1800342- (2019). 10.1002/pssb.201800342 Cited by (5) \| Cite \| Source
Dual Liquid Junction Photoelectrochemistry: Part II. Open-Circuit Photovoltage Variations Due to Surface Chemistry, Interfacial Dipoles, and Non-Ohmic Junctions at Back Contacts (journal article) Russell, Margaret A. \| Kalan, Roghi E. \| Pugliese, Anthony J. \| Carl, Alexander D. \| Masucci, Clare P. \| Strandwitz, Nicholas C. \| Grimm, Ronald L. Journal of The Electrochemical Society, volume 166, issue 13, pages H608-H614 (2019). 10.1149/2.0541913jes Cited by (2) \| Cite \| Source
Plasma-enhanced atomic layer deposition of titanium vanadium nitride (journal article) Sowa, Mark J. \| Ju, Ling \| Kozen, Alexander C. \| Strandwitz, Nicholas C. \| Zeng, Guosong \| Babuska, Tomas F. \| Hsain, Zakaria \| Krick, Brandon A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 36, issue 6 (2018). 10.1116/1.5037463 Cited by (10) \| Cite \| Source
Wafer-Scale Fabrication of Recessed-Channel PtSe2 MOSFETs With Low Contact Resistance and Improved Gate Control (journal article) Li, Lei \| Xiong, Kuanchen \| Marstell, Roderick J. \| Madjar, Asher \| Strandwitz, Nicholas C. \| Hwang, James C. M. \| McEvoy, Niall \| McManus, John B. \| Duesberg, Georg S. \| Goritz, Alexander \| ... \| Kaynak, Mehmet IEEE Transactions on Electron Devices, volume 65, issue 10, pages 4102-4108 (2018). 10.1109/TED.2018.2856305 Cited by (32) \| Cite \| Source

Title	Investigators	Year	Expiration	Amount
GOALI: Ultra-Low Wear Plasma Enhanced Atomic Layer Deposited Nitride Thin Films: Exploring Processing, Structure, Properties and Mechanisms	Strandwitz, Nicholas \| Krick, Brandon \| Sowa, Mark \| Sundaram, Ganesh	01-01-2019	12-31-2021	$622,546
CAREER: Probing Crystallization of Atomic Layers Using In Situ Electron Diffraction	Strandwitz, Nicholas	07-01-2018	06-30-2023	$378,726
MRI: Development of a High Pressure Spatial CVD for Functional Materials	Tansu, Nelson \| Dierolf, Volkmar \| Strandwitz, Nicholas \| Wierer, Jr., Jonathan \| Pimputkar, Siddha	09-01-2017	08-31-2021	$523,999
Silicon Metal-Insulator-Semiconductor Photovoltaics with Atomic Layer Deposited Interfacial Layers	Strandwitz, Nicholas	06-01-2016	05-31-2019	$349,106
Semiconductor Photoanodes for Water Oxidation and Solar Fuels Generation Stabilized Using Atomic Layer Deposition	Strandwitz, Nicholas	09-15-2010	11-30-2012	$200,000