James P. Shiely

ScholarGPS® ID: 83427847004495

Affiliation

Synopsys, Inc.

Affiliation History

Field

Engineering and Computer Science

Discipline

Electrical and Computer Engineering

Top Specialties

Metrics Summary

Publication Count

Predicted Citations

327

Predicted h-index

Ranking

Publications and Citation History

Publications based on Top Specialties

Types of Publication

Publications
Books
Patents
NIH/NSF

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Sub-Resolution Assist Feature Generation with Reinforcement Learning and Transfer Learning (conference) Liu, Guan-Ting \| Tai, Wei-Chen \| Lin, Yi-Ting \| Jiang, Iris Hui-Ru \| Shiely, James P. \| Cheng, Pu-Jen ICCAD '22: IEEE/ACM International Conference on Computer-Aided Design (2022) San Diego California 10.1145/3508352.3549388 Cite \| Source
Novel methodology for SRAF placement over a machine learning generated probability map (conference) Lin, Yi-Ting \| Tseng, Sean Shang-En \| Jiang, Iris Hui-Ru \| Shiely, James P. DTCO and Computational Patterning (2022) San Jose, United States 10.1117/12.2613681 Cite \| Source
Subresolution Assist Feature Insertion by Variational Adversarial Active Learning and Clustering with Data Point Retrieval (conference) Tseng, Sean Shang-En \| Jiang, Iris Hui-Ru \| Shiely, James P. 2021 58th ACM/IEEE Design Automation Conference (DAC) (2021) San Francisco, CA, USA 10.1109/DAC18074.2021.9586238 Cited by (1) \| Cite \| Source
Fast detection of largest repeating layout pattern (conference) Chen, Jingsong \| Shiely, James \| Young, Evangeline F.Y. Design-Process-Technology Co-optimization for Manufacturability XIII (2019) San Jose, United States 10.1117/12.2517194 Cited by (2) \| Cite \| Source
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning (conference) Chien, Sheng-Wei \| Cai, Jia-Syun \| Lee, Chien-Lin \| Tsai, Kuen-Yu \| Shiely, James P. \| St. John, Matt Optical Microlithography XXXII (2019) San Jose, United States 10.1117/12.2515414 Cited by (1) \| Cite \| Source
Efficient search of layout hotspot patterns for matching SEM images using multilevel pixelation (conference) Tseng, Sean Shang-En \| Chang, Wei-Chun \| Jiang, Iris Hui-Ru \| Zhu, Jun \| Shiely, James P. Optical Microlithography XXXII (2019) San Jose, United States 10.1117/12.2514818 Cited by (4) \| Cite \| Source
Machine Learning for Compact Lithographic Process Models (book chapter) In Machine Learning in VLSI Computer-Aided Design Shiely, J. P. Springer International Publishing (2019) 10.1007/978-3-030-04666-8_2 Cited by (1) \| Cite \| Source
The self-driving photomask (conference) Shiely, James P. Photomask Technology (2018) Monterey, United States 10.1117/12.2504982 Cited by (1) \| Cite \| Source
3D resist profile aware etch-bias model (patent) Song, Hua \| Wu, Cheng En \| Shiely, James P. Patent Number: 9646127 (2017) Cite \| Source
Modeling and correcting short-range and long-range effects in E-beam lithography (patent) Song, Hua \| Su, Irene Y. \| Shiely, James P. Patent Number: 9484186 (2016) Cited by (1) \| Cite \| Source
Fast 3D mask model based on implicit countors (patent) Deng, Zhijie \| Yan, Qiliang \| Shiely, James P. Patent Number: 8972229 (2015) Cited by (5) \| Cite \| Source
Detection and removal of self-aligned double patterning artifacts (patent) Du, Yuelin \| Luk-Pat, Gerard \| Miloslavsky, Alexander \| Painter, Benjamin \| Shiely, James \| Song, Hua Patent Number: 8826193 (2014) Cited by (4) \| Cite \| Source
Multi-patterning for sharp corner printing (patent) Du, Yuelin \| Song, Hua \| Shiely, James Patent Number: 8689149 (2014) Cited by (1) \| Cite \| Source
Combining lithography and etch models in OPC modeling (conference) Zavyalova, Lena V. \| Luan, Lan \| Song, Hua \| Schmoeller, Thomas \| Shiely, James P. SPIE Advanced Lithography (2014) San Jose, California, USA 10.1117/12.2049003 Cited by (5) \| Cite \| Source
Modeling EUV lithography shadowing effect (patent) Song, Hua \| Shiely, James P. \| Zavyalova, Lena Patent Number: 8601404 (2013) Cite \| Source
AF printability check with a full-chip 3D resist profile model (conference) Wu, Cheng-En R. \| Chang, Jason \| Song, Hua \| Shiely, James SPIE Photomask Technology (2013) Monterey, California, United States 10.1117/12.2027843 Cited by (4) \| Cite \| Source
Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography (conference) Du, Yuelin \| Ma, Qiang \| Song, Hua \| Shiely, James \| Luk-Pat, Gerard \| Miloslavsky, Alexander \| Wong, Martin D. F. DAC '13: The 50th Annual Design Automation Conference 2013 (2013) Austin Texas 10.1145/2463209.2488848 Cited by (30) \| Cite \| Source
EUV lithography flare calculation and compensation (patent) Song, Hua \| Shiely, James Patent Number: 8443308 (2013) Cited by (9) \| Cite \| Source
Modeling thin-film stack topography effect on a photolithography process (patent) Song, Hua \| Shiely, James P. \| Zhang, Qiaolin Patent Number: 8423917 (2013) Cite \| Source
Enhanced spacer-is-dielectric (sid) decomposition flow with model-based verification (conference) Du, Yuelin \| Song, Hua \| Shiely, James \| Wong, Martin D. F. SPIE Advanced Lithography (2013) San Jose, California, USA 10.1117/12.2011029 Cited by (3) \| Cite \| Source