Neha Thakur

ScholarGPS® ID: 79020658871158

Affiliation

Indian Institute of Technology Mandi, Mandi, India

Affiliation History

Field

Engineering and Computer Science

Discipline

Electrical and Computer Engineering

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Publication Count

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Publications and Citation History

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New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning (journal article) Thakur, Neha \| Reddy, Pulikanti Guruprasad \| Nandi, Santu \| Yogesh, Midathala \| Sharma, Satinder K \| Pradeep, Chullikkattil P \| Ghosh, Subrata \| Gonsalves, Kenneth E Journal of Micromechanics and Microengineering, volume 27, issue 12, pages 125010- (2017). 10.1088/1361-6439/aa8751 Cited by (4) \| Cite \| Source \| Open Access
Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness (journal article) Reddy, Pulikanti Guruprasad \| Thakur, Neha \| Lee, Chien-Lin \| Chien, Sheng-Wei \| Pradeep, Chullikkattil P. \| Ghosh, Subrata \| Tsai, Kuen-Yu \| Gonsalves, Kenneth E. AIP Advances, volume 7, issue 8 (2017). 10.1063/1.4989981 Cited by (12) \| Cite \| Source \| Open Access

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Journal of Micromechanics and Microengineering, volume 27, issue 12, pages 125010- (2017).

AIP Advances, volume 7, issue 8 (2017).