Sheng-Wei Chien

ScholarGPS® ID: 67050015861168

Affiliation

National Taiwan University, Taipei City, Taiwan

Affiliation History

Field

Engineering and Computer Science

Discipline

Electrical and Computer Engineering

Top Specialties

Lithography | Ion Beam

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Publication Count

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Publications and Citation History

Publications based on Top Specialties

Types of Publication

Publications
Books
Patents
NIH/NSF

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Modelling of thermal plasma-assisted carbon tetrafluoride abatement (journal article) Chien, Sheng-Wei \| Chau, Shiu-Wu \| Živný, O. \| Jeništa, J. \| Chen, Shiaw-Huei Journal of Cleaner Production, volume 434 (2024). 10.1016/j.jclepro.2023.139952 Cite \| Source
Efficient electrical characteristics estimation techniques for sub-20-nm FDSOI integrated circuits with nonrectangular gate patterning effects (journal article) Cai, Jia-Syun \| Chien, Sheng-Wei \| Zheng, Xin-Yang \| Lee, Chien-Lin \| Tsai, Kuen-Yu Journal of Micro/Nanopatterning, Materials, and Metrology, volume 20, issue 03 (2021). 10.1117/1.JMM.20.3.033401 Cited by (1) \| Cite \| Source
Investigation on helium ion beam lithography with proximity effect correction (journal article) Lee, Chien-Lin \| Chien, Sheng-Wei \| Tsai, Kuen-Yu \| Liu, Chun-Hung Journal of Micro/Nanopatterning, Materials, and Metrology, volume 20, issue 03 (2021). 10.1117/1.JMM.20.3.033201 Cited by (1) \| Cite \| Source
Precision fabrication of EUVL programmed defects with helium ion beam patterning (journal article) Lee, Chien-Lin \| Cai, Jia-Syun \| Chien, Sheng-Wei \| Tsai, Kuen-Yu \| Li, Jia-Han \| Lee, Chao-Te Journal of Micro/Nanopatterning, Materials, and Metrology, volume 20, issue 02 (2021). 10.1117/1.JMM.20.2.023001 Cite \| Source
Comparison of Abatement Models for CF4 Reacting With Nitrogen Thermal Plasma (journal article) Chau, Shiu-Wu \| Chien, Sheng-Wei \| Chen, Shiaw-Huei IEEE Transactions on Plasma Science, volume 49, issue 1, pages 120-146 (2021). 10.1109/TPS.2020.3028583 Cited by (1) \| Cite \| Source
Precision fabrication of EUVL programmed defects with helium ion beam lithography (conference) Lee, Chien-Lin \| Cai, Jia-Syun \| Chien, Sheng-Wei \| Tsai, Kuen-Yu International Conference on Extreme Ultraviolet Lithography 2019 (2019) Monterey, United States 10.1117/12.2536874 Cited by (1) \| Cite \| Source
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning (conference) Chien, Sheng-Wei \| Cai, Jia-Syun \| Lee, Chien-Lin \| Tsai, Kuen-Yu \| Shiely, James P. \| St. John, Matt Optical Microlithography XXXII (2019) San Jose, United States 10.1117/12.2515414 Cited by (1) \| Cite \| Source
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates (conference) Cai, Jia-Syun \| Chien, Sheng-Wei \| Zheng, Xin-Yang \| Lee, Chien-Lin \| Tsai, Kuen-Yu Design-Process-Technology Co-optimization for Manufacturability XIII (2019) San Jose, United States 10.1117/12.2515186 Cited by (1) \| Cite \| Source
Model-based proximity effect correction for helium ion beam lithography (conference) Tsai, Kuen-Yu \| Lee, Chien-Lin \| Chien, Sheng-Wei Novel Patterning Technologies 2018 (2018) San Jose, United States 10.1117/12.2297691 Cited by (1) \| Cite \| Source
Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness (journal article) Reddy, Pulikanti Guruprasad \| Thakur, Neha \| Lee, Chien-Lin \| Chien, Sheng-Wei \| Pradeep, Chullikkattil P. \| Ghosh, Subrata \| Tsai, Kuen-Yu \| Gonsalves, Kenneth E. AIP Advances, volume 7, issue 8 (2017). 10.1063/1.4989981 Cited by (12) \| Cite \| Source \| Open Access
Fabrication of metrology test structures with helium ion beam direct write (conference) Lee, Chien-Lin \| Chien, Sheng-Wei \| Chen, Sheng-Yung \| Liu, Chun-Hung \| Tsai, Kuen-Yu \| Li, Jia-Han \| Shew, Bor-Yuan \| Hong, Chit-Sung \| Lee, Chao-Te SPIE Advanced Lithography (2017) San Jose, California, United States 10.1117/12.2257989 Cited by (1) \| Cite \| Source
Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography (journal article) Liu, Chun-Hung \| Ng, Philip C. W. \| Shen, Yu-Tian \| Chien, Sheng-Wei \| Tsai, Kuen-Yu Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, volume 31, issue 2 (2013). 10.1116/1.4790655 Cited by (6) \| Cite \| Source
Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography (journal article) Ng, Philip C. W. \| Chien, Sheng-Wei \| Chang, Bo-Sen \| Tsai, Kuen-Yu \| Lu, Yi-Chang \| Li, Jia-Han \| Chen, Alek C. Japanese Journal of Applied Physics, volume 50, issue 6S, pages 06GB07- (2011). 10.7567/JJAP.50.06GB07 Cited by (1) \| Cite \| Source
Genetic-fuzzy association rules for network intrusion detection systems (conference) Su, Ming-Yang \| Lin, Chun-Yuen \| Chien, Sheng-Wei \| Hsu, Han-Chung 2011 IEEE International Conference on Fuzzy Systems (FUZZ-IEEE) (2011) Taipei, Taiwan 10.1109/FUZZY.2011.6007555 Cited by (6) \| Cite \| Source
Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography (journal article) Ng, Philip C. W. \| Chien, Sheng-Wei \| Chang, Bo-Sen \| Tsai, Kuen-Yu \| Lu, Yi-Chang \| Li, Jia-Han \| Chen, Alek C. Japanese Journal of Applied Physics, volume 50, issue 6S, pages 06GB07- (2011). 10.1143/JJAP.50.06GB07 Cited by (3) \| Cite \| Source