Ling Ju

ScholarGPS™ ID: 67027083435095

Affiliation

Lehigh University, Bethlehem, United States

Affiliation History

Field

Engineering and Computer Science

Discipline

Materials Science and Engineering

Top Specialties

Atomic Layer Deposition

Metrics Summary

Publication Count

Predicted Citations

115

Predicted h-index

Ranking

Publications and Citation History

Publications based on Top Specialties

Types of Publication

Publications
Books
Patents
NIH/NSF


Surface pretreatment and deposition temperature dependence of MgO epitaxy on GaN by thermal atomic layer deposition (journal article) Goodrich, Justin C. \| Farinha, Thomas G. \| Ju, Ling \| Howzen, Alexandra J. \| Kundu, Animesh \| Ogidi-Ekoko, Onoriode N. \| Wierer, Jonathan J. \| Tansu, Nelson \| Strandwitz, Nicholas C. Journal of Crystal Growth, volume 536 (2020). 10.1016/j.jcrysgro.2020.125568 Cited by (6) \| Cite \| Source
Plasma-enhanced atomic layer deposition of vanadium nitride (journal article) Kozen, Alexander C. \| Sowa, Mark J. \| Ju, Ling \| Strandwitz, Nicholas C. \| Zeng, Guosong \| Babuska, Tomas F. \| Hsain, Zakaria \| Krick, Brandon A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 37, issue 6 (2019). 10.1116/1.5109671 Cited by (6) \| Cite \| Source
Quartz crystal microbalance study of precursor diffusion during molecular layer deposition using cyclic azasilane, maleic anhydride, and water (journal article) Ju, Ling \| Vemuri, Vamseedhara \| Strandwitz, Nicholas C. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 37, issue 3 (2019). 10.1116/1.5093509 Cited by (5) \| Cite \| Source
Plasma-enhanced atomic layer deposition of titanium vanadium nitride (journal article) Sowa, Mark J. \| Ju, Ling \| Kozen, Alexander C. \| Strandwitz, Nicholas C. \| Zeng, Guosong \| Babuska, Tomas F. \| Hsain, Zakaria \| Krick, Brandon A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 36, issue 6 (2018). 10.1116/1.5037463 Cited by (10) \| Cite \| Source
Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition (journal article) Yemane, Y T \| Sowa, M J \| Zhang, J \| Ju, L \| Deguns, E W \| Strandwitz, N C \| Prinz, F B \| Provine, J Superconductor Science and Technology, volume 30, issue 9, pages 095010- (2017). 10.1088/1361-6668/aa7ce3 Cited by (11) \| Cite \| Source
Molecular layer deposition using cyclic azasilanes, maleic anhydride, trimethylaluminum, and water (journal article) Ju, Ling \| Bao, Bo \| King, Sean W. \| Strandwitz, Nicholas C. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 35, issue 1 (2017). 10.1116/1.4972418 Cited by (7) \| Cite \| Source
Plasma-enhanced atomic layer deposition of superconducting niobium nitride (journal article) Sowa, Mark J. \| Yemane, Yonas \| Zhang, Jinsong \| Palmstrom, Johanna C. \| Ju, Ling \| Strandwitz, Nicholas C. \| Prinz, Fritz B. \| Provine, J. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, volume 35, issue 1 (2017). 10.1116/1.4972858 Cited by (18) \| Cite \| Source
Cyclic azasilanes as volatile and reactive precursors for atomic layer deposition of silicon dioxide (journal article) Ju, Ling \| Strandwitz, Nicholas C. Journal of Materials Chemistry C, volume 4, issue 18, pages 4034-4039 (2016). 10.1039/C5TC03896K Cited by (20) \| Cite \| Source
In situ measurement of fixed charge evolution at silicon surfaces during atomic layer deposition (journal article) Ju, Ling \| Watt, Morgan R. \| Strandwitz, Nicholas C. Applied Physics Letters, volume 106, issue 6 (2015). 10.1063/1.4907974 Cited by (5) \| Cite \| Source