Jia-Syun Cai

ScholarGPS® ID: 48159713516943

Affiliation

National Taiwan University, Taipei City, Taiwan

Affiliation History

Field

Engineering and Computer Science

Discipline

Electrical and Computer Engineering

Top Specialties

Ion Beam

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Publication Count

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Publications and Citation History

Publications based on Top Specialties

Types of Publication

Publications
Books
Patents
NIH/NSF

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A transistor sizing method for standard-cell optimization considering lithography effects (conference) Cai, Jia-Syun \| Su, Pin-Yuan \| Lee, Chien-Lin \| Tsai, Kuen-Yu DTCO and Computational Patterning III (2024) San Jose, United States 10.1117/12.3012028 Cite \| Source
The Implement of a Reconfigurable Intelligence Trust Chain Platform with Anti-counterfeit Traceable Version Function for the Customized System-Module-IC (book chapter) In Innovative Mobile and Internet Services in Ubiquitous Computing Chen, Hsing-Chung \| Liang, Yao-Hsien \| Su, Jhih-Sheng \| Tsai, Kuen-Yu \| Song, Yu-Lin \| Hsu, Pei-Yu \| Cai, Jia-Syun Springer Nature Switzerland (2023) 10.1007/978-3-031-35836-4_28 Cited by (1) \| Cite \| Source
Efficient electrical characteristics estimation techniques for sub-20-nm FDSOI integrated circuits with nonrectangular gate patterning effects (journal article) Cai, Jia-Syun \| Chien, Sheng-Wei \| Zheng, Xin-Yang \| Lee, Chien-Lin \| Tsai, Kuen-Yu Journal of Micro/Nanopatterning, Materials, and Metrology, volume 20, issue 03 (2021). 10.1117/1.JMM.20.3.033401 Cited by (1) \| Cite \| Source
Precision fabrication of EUVL programmed defects with helium ion beam patterning (journal article) Lee, Chien-Lin \| Cai, Jia-Syun \| Chien, Sheng-Wei \| Tsai, Kuen-Yu \| Li, Jia-Han \| Lee, Chao-Te Journal of Micro/Nanopatterning, Materials, and Metrology, volume 20, issue 02 (2021). 10.1117/1.JMM.20.2.023001 Cite \| Source
Precision fabrication of EUVL programmed defects with helium ion beam lithography (conference) Lee, Chien-Lin \| Cai, Jia-Syun \| Chien, Sheng-Wei \| Tsai, Kuen-Yu International Conference on Extreme Ultraviolet Lithography 2019 (2019) Monterey, United States 10.1117/12.2536874 Cited by (1) \| Cite \| Source
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning (conference) Chien, Sheng-Wei \| Cai, Jia-Syun \| Lee, Chien-Lin \| Tsai, Kuen-Yu \| Shiely, James P. \| St. John, Matt Optical Microlithography XXXII (2019) San Jose, United States 10.1117/12.2515414 Cited by (1) \| Cite \| Source
Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates (conference) Cai, Jia-Syun \| Chien, Sheng-Wei \| Zheng, Xin-Yang \| Lee, Chien-Lin \| Tsai, Kuen-Yu Design-Process-Technology Co-optimization for Manufacturability XIII (2019) San Jose, United States 10.1117/12.2515186 Cited by (1) \| Cite \| Source