Chien-Lin Lee

ScholarGPS® ID: 29045531377196

Affiliation

National Taiwan University, Taipei City, Taiwan

Affiliation History

Field

Engineering and Computer Science

Discipline

Electrical and Computer Engineering

Top Specialties

Ion Beam

Metrics Summary

Publication Count

Predicted Citations

Predicted h-index

Ranking

Publications and Citation History

Publications based on Top Specialties

Types of Publication

Publications
Books
Patents
NIH/NSF

Add Delete
A transistor sizing method for standard-cell optimization considering lithography effects (conference) Cai, Jia-Syun \| Su, Pin-Yuan \| Lee, Chien-Lin \| Tsai, Kuen-Yu DTCO and Computational Patterning III (2024) San Jose, United States 10.1117/12.3012028 Cite \| Source
Efficient electrical characteristics estimation techniques for sub-20-nm FDSOI integrated circuits with nonrectangular gate patterning effects (journal article) Cai, Jia-Syun \| Chien, Sheng-Wei \| Zheng, Xin-Yang \| Lee, Chien-Lin \| Tsai, Kuen-Yu Journal of Micro/Nanopatterning, Materials, and Metrology, volume 20, issue 03 (2021). 10.1117/1.JMM.20.3.033401 Cited by (1) \| Cite \| Source
Investigation on helium ion beam lithography with proximity effect correction (journal article) Lee, Chien-Lin \| Chien, Sheng-Wei \| Tsai, Kuen-Yu \| Liu, Chun-Hung Journal of Micro/Nanopatterning, Materials, and Metrology, volume 20, issue 03 (2021). 10.1117/1.JMM.20.3.033201 Cited by (1) \| Cite \| Source
Precision fabrication of EUVL programmed defects with helium ion beam patterning (journal article) Lee, Chien-Lin \| Cai, Jia-Syun \| Chien, Sheng-Wei \| Tsai, Kuen-Yu \| Li, Jia-Han \| Lee, Chao-Te Journal of Micro/Nanopatterning, Materials, and Metrology, volume 20, issue 02 (2021). 10.1117/1.JMM.20.2.023001 Cite \| Source
Precision fabrication of EUVL programmed defects with helium ion beam lithography (conference) Lee, Chien-Lin \| Cai, Jia-Syun \| Chien, Sheng-Wei \| Tsai, Kuen-Yu International Conference on Extreme Ultraviolet Lithography 2019 (2019) Monterey, United States 10.1117/12.2536874 Cited by (1) \| Cite \| Source
Model-based proximity effect correction for helium ion beam lithography (conference) Tsai, Kuen-Yu \| Lee, Chien-Lin \| Chien, Sheng-Wei Novel Patterning Technologies 2018 (2018) San Jose, United States 10.1117/12.2297691 Cited by (1) \| Cite \| Source
Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness (journal article) Reddy, Pulikanti Guruprasad \| Thakur, Neha \| Lee, Chien-Lin \| Chien, Sheng-Wei \| Pradeep, Chullikkattil P. \| Ghosh, Subrata \| Tsai, Kuen-Yu \| Gonsalves, Kenneth E. AIP Advances, volume 7, issue 8 (2017). 10.1063/1.4989981 Cited by (12) \| Cite \| Source \| Open Access
Fabrication of metrology test structures with helium ion beam direct write (conference) Lee, Chien-Lin \| Chien, Sheng-Wei \| Chen, Sheng-Yung \| Liu, Chun-Hung \| Tsai, Kuen-Yu \| Li, Jia-Han \| Shew, Bor-Yuan \| Hong, Chit-Sung \| Lee, Chao-Te SPIE Advanced Lithography (2017) San Jose, California, United States 10.1117/12.2257989 Cited by (1) \| Cite \| Source
Development of Capillary Loop Convective Polymerase Chain Reaction Platform with Real-Time Fluorescence Detection (journal article) Chou, Wen-Pin \| Lee, Chien \| Hsu, Zong-Jyun \| Lai, Mei-Hui \| Kuo, Long-Sheng \| Chen, Ping-Hei Inventions, volume 2, issue 1, pages 3- (2017). 10.3390/inventions2010003 Cited by (6) \| Cite \| Source \| Open Access
A real-time equipment monitoring and fault detection system (conference) Guo, R.S. \| Chen, A. \| Tseng, C.L. \| Fong, I.K. \| Yang, A. \| Lee, C.L. \| Wu, C.H. \| Lin, S. \| Huang, S.J. \| Lee, Y.C. \| ... \| Lee, M.Y. 1998 Semiconductor Manufacturing Technology Workshop (1998) Hsinchu, Taiwan 10.1109/SMTW.1998.722666 Cited by (8) \| Cite \| Source