Miin-Jang Chen | Scholar Profiles and Rankings

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Atomic layer epitaxy of twinned TiN by hydrogen-manipulated tailoring on monolayer (journal article) Jiang, Yu-Sen \| Shiojiri, Makoto \| Shyue, Jing-Jong \| Chen, Miin-Jang Acta Materialia, volume 268 (2024). 10.1016/j.actamat.2024.119750 Cited by (1) \| Cite \| Source
Atomic layer engineering on resistive switching in sub-4 nm AlN resistive random access memory devices (journal article) Ling, Chen-Hsiang \| Mo, Chi-Lin \| Chuang, Chun-Ho \| Shyue, Jing-Jong \| Chen, Miin-Jang Journal of Materials Chemistry C, volume 11, issue 33, pages 11195-11203 (2023). 10.1039/D3TC00542A Cited by (1) \| Cite \| Source
High-quality AlN epilayers prepared by atomic layer deposition and large-area rapid electron beam annealing (journal article) Kao, Wei-Chung \| Jhong, Fong-Jyun \| Yin, Yu-Tung \| Lin, Hsin-Chih \| Chen, Miin-Jang Materials Chemistry and Physics, volume 304 (2023). 10.1016/j.matchemphys.2023.127895 Cited by (1) \| Cite \| Source
Dielectric Constant Enhancement and Leakage Current Suppression of Metal–Insulator–Metal Capacitors by Atomic Layer Annealing and the Capping Layer Effect Prepared with a Low Thermal Budget (journal article) Wang, Chun-Yuan \| Huang, Hung-Chih \| Chou, Chun-Yi \| Chen, Hsing-Yang \| Ling, Chen-Hsiang \| Lin, Hsin-Chih \| Chen, Miin-Jang ACS Applied Electronic Materials, volume 5, issue 5, pages 2487-2494 (2023). 10.1021/acsaelm.2c01287 Cite \| Source
Impact of monolayer engineering on ferroelectricity of sub-5 nm Hf0.5Zr0.5O2 thin films (journal article) Wang, Ting-Yun \| Mo, Chi-Lin \| Chou, Chun-Yi \| Chuang, Chun-Ho \| Chen, Miin-Jang Acta Materialia, volume 250 (2023). 10.1016/j.actamat.2023.118848 Cited by (1) \| Cite \| Source
Wake-up-free ferroelectric Hf0.5Zr0.5O2 thin films characterized by precession electron diffraction (journal article) Chang, Teng-Jan \| Chen, Hsing-Yang \| Wang, Chin-I \| Lin, Hsin-Chih \| Hsu, Chen-Feng \| Wang, Jer-Fu \| Nien, Chih-Hung \| Chang, Chih-Sheng \| Radu, Iuliana P. \| Chen, Miin-Jang Acta Materialia, volume 246 (2023). 10.1016/j.actamat.2023.118707 Cited by (5) \| Cite \| Source
Inhibitor-Free Area-Selective Atomic Layer Deposition with Feature Size Down to Nearly 10 nm (journal article) Chou, Chun-Yi \| Mo, Chi-Lin \| Chuu, Chih-Piao \| Wang, Ting-Yun \| Huang, Chin-Chao \| Hou, Cheng-Hung \| Chuang, Chun-Ho \| Jiang, Yu-Sen \| Shyue, Jing-Jong \| Chen, Miin-Jang Chemistry of Materials, volume 35, issue 3, pages 1107-1115 (2023). 10.1021/acs.chemmater.2c03046 Cited by (2) \| Cite \| Source
Ferroelectric ZrO2 ultrathin films on silicon for metal-ferroelectric-semiconductor capacitors and transistors (journal article) Jiang, Yu-Sen \| Huang, Kuei-Wen \| Yi, Sheng-Han \| Wang, Chin-I \| Chang, Teng-Jan \| Kao, Wei-Chung \| Wang, Chun-Yuan \| Yin, Yu-Tung \| Shieh, Jay \| Chen, Miin-Jang Journal of the European Ceramic Society, volume 42, issue 15, pages 6997-7003 (2022). 10.1016/j.jeurceramsoc.2022.07.031 Cited by (5) \| Cite \| Source
Large area and rapid electron beam annealing for high-quality epitaxial GaN layer (journal article) Lee, Wei-Hao \| Jhong, Fong-Jyun \| Yin, Yu-Tung \| Chou, Chun-Yi \| Shyue, Jing-Jong \| Chen, Miin-Jang Materials Research Bulletin, volume 153 (2022). 10.1016/j.materresbull.2022.111903 Cited by (1) \| Cite \| Source
Enhancement of energy storage for electrostatic supercapacitors through built-in electric field engineering (journal article) Yi, Sheng-Han \| Chan, Yu-Chen \| Mo, Chi-Lin \| Lin, Hsin-Chih \| Chen, Miin-Jang Nano Energy, volume 99 (2022). 10.1016/j.nanoen.2022.107342 Cited by (12) \| Cite \| Source
Ferroelectric enhancement of Al-doped HfO2 thin films by rapid electron beam annealing in a low thermal budget (journal article) Wang, Ting-Yun \| Kao, Wei-Chung \| Yin, Yu-Tung \| Shieh, Jay \| Chen, Miin-Jang Journal of the European Ceramic Society, volume 42, issue 10, pages 4221-4226 (2022). 10.1016/j.jeurceramsoc.2022.03.064 Cited by (4) \| Cite \| Source
Atomic tailoring of low-thermal-budget and nearly wake-up-free ferroelectric Hf0.5Zr0.5O2 nanoscale thin films by atomic layer annealing (journal article) Chang, Teng-Jan \| Jiang, Yu-Sen \| Yi, Sheng-Han \| Chou, Chun-Yi \| Wang, Chin-I \| Lin, Hsin-Chih \| Chen, Miin-Jang Applied Surface Science, volume 591 (2022). 10.1016/j.apsusc.2022.153110 Cited by (12) \| Cite \| Source
Cryogenic Si/SiGe Heterostructure Flash Memory Devices (journal article) Hou, Wei-Chih \| Hsu, Nai-Wen \| Wang, Tz-Ming \| Liu, Chia-You \| Kao, Hsiang-Shun \| Chen, Miin-Jang \| Li, Jiun-Yun ACS Applied Electronic Materials, volume 4, issue 6, pages 2879-2884 (2022). 10.1021/acsaelm.2c00364 Cited by (1) \| Cite \| Source
Conformal atomic layer etching for Ge based on sacrificial oxide with higher Gibbs free energy of formation (journal article) Ling, Chen-Hsiang \| Chou, Chun-Yi \| Chung, Tsai-Fu \| Shyue, Jing-Jong \| Yang, Jer-Ren \| Chen, Miin-Jang Surfaces and Interfaces, volume 30 (2022). 10.1016/j.surfin.2022.101893 Cite \| Source
Atomic layer annealing for modulation of the work function of TiN metal gate for n-type MOS devices (journal article) Wang, Chun-Yuan \| Chou, Chun-Yi \| Shiue, Han-Fang \| Chen, Hsing-Yang \| Ling, Chen-Hsiang \| Shyue, Jing-Jong \| Chen, Miin-Jang Applied Surface Science, volume 585 (2022). 10.1016/j.apsusc.2022.152748 Cited by (7) \| Cite \| Source
Wake-up free Hf0.5Zr0.5O2 thin film with enhanced ferroelectricity and reliability synthesized by atomic layer crystallization induced by substrate biasing (journal article) Chou, Chun-Yi \| Chen, Hsing-Yang \| Jiang, Yu-Sen \| Lin, Hsin-Chih \| Chen, Miin-Jang Acta Materialia, volume 228 (2022). 10.1016/j.actamat.2022.117762 Cited by (6) \| Cite \| Source
Improvement of Corrosion Resistance and Biocompatibility of Biodegradable Mg–Ca Alloy by ALD HfZrO2 Film (journal article) Lin, Pi-Chen \| Lin, Kaifan \| Lin, Yu-Hsuan \| Yang, Kai-Chiang \| Semenov, Vladimir Ivanovitch \| Lin, Hsin-Chih \| Chen, Miin-Jang Coatings, volume 12, issue 2, pages 212- (2022). 10.3390/coatings12020212 Cited by (1) \| Cite \| Source
Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy (journal article) Lin, P.C. \| Lin, K.F. \| Chiu, C. \| Semenov, V.I. \| Lin, H.C. \| Chen, M.J. Surface and Coatings Technology, volume 427 (2021). 10.1016/j.surfcoat.2021.127811 Cited by (6) \| Cite \| Source
Atomic layer deposited TiN capping layer for sub-10 nm ferroelectric Hf0.5Zr0.5O2 with large remnant polarization and low thermal budget (journal article) Wang, Chin-I \| Wang, Chun-Yuan \| Chang, Teng-Jan \| Jiang, Yu-Sen \| Shyue, Jing-Jong \| Lin, Hsin-Chih \| Chen, Miin-Jang Applied Surface Science, volume 570 (2021). 10.1016/j.apsusc.2021.151152 Cited by (12) \| Cite \| Source
Evolution of pronounced ferroelectricity in Hf0.5 Zr0.5 O2 thin films scaled down to 3 nm (journal article) Wang, Chin-I \| Chen, Hsin-Yang \| Wang, Chun-Yuan \| Chang, Teng-Jan \| Jiang, Yu-Sen \| Chang, Chih-Sheng \| Chen, Miin-Jang Journal of Materials Chemistry C, volume 9, issue 37, pages 12759-12767 (2021). 10.1039/D1TC01778K Cited by (13) \| Cite \| Source