Kenneth E. Gonsalves

ScholarGPS® ID: 21408424130640

Affiliation
Indian Institute of Technology Mandi, Mandi, India
Affiliation History

Field
Engineering and Computer Science
Discipline
Electrical and Computer Engineering
Top Specialties
Polymer | Lithography | Chemical Synthesis | Nanocomposite | Ceramic | Microelectronics | Composite Material | Polymer Chemistry | Laser | Ion Beam | Nanolithography | Radiation | Aerosol | Extreme Ultraviolet | Gallium Nitride
Metrics Summary
Publication Count
225
Predicted Citations
4,627
Predicted h-index
40
Ranking

Publications and Citation History

Publications based on Top Specialties

Types of Publication

  • Publications
  • Books
  • Patents
  • NIH/NSF
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Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies (journal article)
Choudhary, Sumit | Yogesh, Midathala | Schwarz, Daniel | Funk, Hannes S. | Ghosh, Subrata | Sharma, Satinder K. | Schulze, Jörg | Gonsalves, Kenneth E.
Journal of Vacuum Science & Technology B, volume 41, issue 5 (2023).
10.1116/6.0002767
Cited by (2) | Cite | Source
Induced Chemical Networking of Organometallic Tin in a Cyclic Framework for Sub-10 nm Patterning and Interconnect Application (journal article)
Nandi, Santu | Khillare, Lalit | Kumar, Sunil | Moinuddin, Mohamad G. | Chauhan, Manvendra | Choudhary, Sumit | Sharma, Satinder K. | Ghosh, Subrata | Gonsalves, Kenneth E.
ACS Applied Nano Materials, volume 6, issue 6, pages 4132-4140 (2023).
10.1021/acsanm.2c04831
Cited by (3) | Cite | Source
Ultrasensitive metal-organic cluster resist for patterning of single exposure high numerical aperture extreme ultraviolet lithography applications (journal article)
Chauhan, Manvendra | Palit, Kumar | Choudhary, Sumit | Sharma, Satinder K. | Gonsalves, Kenneth E.
Journal of Micro/Nanopatterning, Materials, and Metrology, volume 21, issue 04 (2022).
10.1117/1.JMM.21.4.044603
Cited by (1) | Cite | Source
Macrocycle Network-Aided Nanopatterning of Inorganic Resists on Silicon (journal article)
Nandi, Santu | Khillare, Lalit | Moinuddin, Mohamad G. | Kumar, Sunil | Chauhan, Manvendra | Sharma, Satinder K. | Ghosh, Subrata | Gonsalves, Kenneth E.
ACS Applied Nano Materials, volume 5, issue 8, pages 10268-10279 (2022).
10.1021/acsanm.2c01321
Cited by (7) | Cite | Source
Organotin bearing polymeric resists for electron beam lithography (journal article)
Yogesh, Midathala | Moinuddin, Mohamad G. | Khillare, Lalit D. | Chinthalapalli, Srinivas | Sharma, Satinder K. | Ghosh, Subrata | Gonsalves, Kenneth E.
Microelectronic Engineering, volume 260 (2022).
10.1016/j.mee.2022.111795
Cited by (12) | Cite | Source
Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning (journal article)
Yogesh, Midathala | Moinuddin, Mohamad. G. | Chauhan, Manvendra | Sharma, Satinder K. | Ghosh, Subrata | Gonsalves, Kenneth E.
ACS Applied Electronic Materials, volume 3, issue 5, pages 1996-2004 (2021).
10.1021/acsaelm.0c01120
Cited by (21) | Cite | Source
Development of metal-organic cluster based negative tone resist: pre-screened through the helium-ion beam prelude to extreme ultraviolet lithography (EUVL) applications (conference)
Sharma, Satinder Kumar | Chauhan, Manvendra | Kumar, Rudra | Palit, Kumar | Choudhary, Sumit | Gonsalves, Kenneth E.
Advances in Patterning Materials and Processes XXXVIII (2021)
Online Only, United States
10.1117/12.2583850
Cited by (1) | Cite | Source
Resists for Helium Ion Beam Lithography: Recent Advances (journal article)
Ravi Kiran, Nagarjuna | Chauhan, Manvendra | Sharma, Satinder K. | Ghosh, Subrata | Gonsalves, Kenneth E.
ACS Applied Electronic Materials, volume 2, issue 12, pages 3805-3817 (2020).
10.1021/acsaelm.0c00627
Cited by (17) | Cite | Source
Mechanistic insights of Sn-based non-chemically-amplified resists under EUV irradiation (journal article)
Belmonte, Guilherme K. | Cendron, Suelen W. | Guruprasad Reddy, Pulikanti | Moura, Cleverson A.S. | Ghulam Moinuddin, Mohamad | Peter, Jerome | Sharma, Satinder K. | Albara Lando, Gabriela | Puiatti, Marcelo | Gonsalves, Kenneth E. | Weibel, Daniel E.
Applied Surface Science, volume 533 (2020).
10.1016/j.apsusc.2020.146553
Cited by (13) | Cite | Source
Functionalized Ag Nanoparticles Embedded in Polymer Resists for High-Resolution Lithography (journal article)
Moinuddin, Mohamad G. | Kumar, Rudra | Yogesh, Midathala | Sharma, Shivani | Sahani, Manoj | Sharma, Satinder K. | Gonsalves, Kenneth E.
ACS Applied Nano Materials, volume 3, issue 9, pages 8651-8661 (2020).
10.1021/acsanm.0c01362
Cited by (9) | Cite | Source
Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography (journal article)
Peter, Jerome | Moinuddin, Mohamad G. | Ghosh, Subrata | Sharma, Satinder K. | Gonsalves, Kenneth E.
ACS Applied Polymer Materials, volume 2, issue 5, pages 1790-1799 (2020).
10.1021/acsapm.0c00005
Cited by (27) | Cite | Source
Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography (journal article)
Kumar, Rudra | Chauhan, Manvendra | Moinuddin, Mohamad G. | Sharma, Satinder K. | Gonsalves, Kenneth E.
ACS Applied Materials & Interfaces, volume 12, issue 17, pages 19616-19624 (2020).
10.1021/acsami.9b21414
Cited by (31) | Cite | Source
All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning (conference)
Sharma, Satinder | Kumar, Rudra | Chauhan, Manvendra | Moinuddin, Mohamad G. | Peter, Jerome | Ghosh, Subrata | Pradeep, Chullikkattil P. | Gonsalves, Kenneth E.
Advances in Patterning Materials and Processes XXXVII (2020)
San Jose, United States
10.1117/12.2552189
Cited by (5) | Cite | Source
Focusing on nanoparticles based photomultiplier in n-CARs (conference)
Sharma, Satinder | Moinuddin, Mohamad G. | Yogesh, Midathala | Sharma, Shivani | Sahani, Manoj | Ghosh, Subrata | Gonsalves, Kenneth E.
Advances in Patterning Materials and Processes XXXVII (2020)
San Jose, United States
10.1117/12.2552190
Cited by (2) | Cite | Source
Polarization Dependence in the Carbon K-Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study (journal article)
Moura, Cleverson A. S. | Belmonte, Guilherme K. | Segala, Maximiliano | Gonsalves, Kenneth E. | Weibel, Daniel E.
The Journal of Physical Chemistry C, volume 122, issue 50, pages 28619-28628 (2018).
10.1021/acs.jpcc.8b07288
Cited by (3) | Cite | Source
EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study (journal article)
Belmonte, Guilherme Kretzmann | da Silva Moura, Cleverson Alves | Reddy, Pulikanti Guruprasad | Gonsalves, Kenneth E. | Weibel, Daniel Eduardo
Journal of Photochemistry and Photobiology A: Chemistry, volume 364 (2018).
10.1016/j.jphotochem.2018.06.005
Cited by (16) | Cite | Source
Enhanced mechanical properties of the high-resolution EUVL patterns of hybrid photoresists containing hexafluoroantimonate (journal article)
Kumar, Pawan | Reddy, Pulikanti Guruprasad | Sharma, Satinder K. | Ghosh, Subrata | Pradeep, Chullikkattil P. | Gonsalves, Kenneth E.
Microelectronic Engineering, volume 194 (2018).
10.1016/j.mee.2018.03.014
Cited by (4) | Cite | Source
Evaluation of high-resolution and sensitivity of n-CAR hybrid resist for sub-16nm or below technology node (conference)
Sharma, Satinder Kumar | Moinuddin, Mohamad Ghulam | Reddy, Pulikanti Guruprasad | Pradeep, Chullikkattil P. | Ghosh, Subrata | Gonsalves, Kenneth E.
Extreme Ultraviolet (EUV) Lithography IX (2018)
San Jose, United States
10.1117/12.2297565
Cited by (3) | Cite | Source
Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications (conference)
Reddy, Pulikanti Guruprasad | Moinuddin, Mohamad Ghulam | Ghosh, Subrata | Pradeep, Chullikkattil P. Pradeep | Gonsalves, Kenneth | Sharma, Satinder K.
Novel Patterning Technologies 2018 (2018)
San Jose, United States
10.1117/12.2297537
Cited by (3) | Cite | Source
Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications (journal article)
Reddy, Pulikanti Guruprasad | Moinuddin, M. G. | Joseph, Aneesh M. | Nandi, Santu | Ghosh, Subrata | Pradeep, Chullikkattil P. | Sharma, Satinder K. | Gonsalves, Kenneth E.
Journal of Photopolymer Science and Technology, volume 31, issue 6, pages 669-678 (2018).
10.2494/photopolymer.31.669
Cited by (2) | Cite | Source